Organometallic precursors for the formation of GaN by MOCVD: the spectroscopic and gas-phase electron diffraction structural characterisation of Me3Ga·NHMe2 and [Me2Ga(μ-NMe2)]2-Reference-Cited by-同舟云学术

Organometallic precursors for the formation of GaN by MOCVD: the spectroscopic and gas-phase electron diffraction structural characterisation of Me3Ga·NHMe2 and [Me2Ga(μ-NMe2)]2

Published:1995-02 Issue: Volume:346 Page:83-94
ISSN:0022-2860
Container-title:Journal of Molecular Structure
language:en
Short-container-title:Journal of Molecular Structure

Author:

Almond Matthew J.,Beer Carolyn E.,Rice David A.,Hagen Kolbjørn

Publisher

Elsevier BV

Subject

Inorganic Chemistry,Organic Chemistry,Spectroscopy,Analytical Chemistry

Reference22 articles.

1. Organometallic precursors to the formation of GaN by MOCVD: structural characterisation of Me3Ga · NH3 by gas-phase electron diffraction

2. Organometallic precursors for the formation of GaN by metal-organic chemical vapour deposition: a study of [(CH3)2GaNH2]3

3. Single-Source III/V Precursors: A New Approach to Gallium Arsenide and Related Semiconductors

4. Adducts of trimethylgallium and perdeuteriotrimethylgallium with amine ligands and some dimethylgallium organyl pnictides (N, P, As). X-ray crystal structures of [Me3Ga·NH(C6H11)2] and [Me3Ga·HMe]

5. Primary amido and amine adduct complexes of gallium: synthesis and structures of [t-Bu2Ga(μ-NHPh)]2 and t-Bu3Ga·NH2Ph

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