A new fabrication technology for very-large-area TFT-LCDs-Reference-Cited by-同舟云学术

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A new fabrication technology for very-large-area TFT-LCDs

Published:1993-04 Issue:2 Volume:14 Page:125-130
ISSN:0141-9382
Container-title:Displays
language:en
Short-container-title:Displays

Author:

Kaneko Eiji

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Hardware and Architecture,Human-Computer Interaction

Reference12 articles.

1. 1280 × 800 color pixel 15 inch full color active matrix liquid crystal display;Wada,1990

2. A 14in-diagonal full-color a-Si TFT-LCD;Nagayasu,1988

3. Large area network;Kaneko,1990

4. A new process concept for large-area patterning;Mori,1991

5. A TFT fabrication by gravure offset printing without mask aligner;Okazaki,1991

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Deep-Learning-Enabled Automatic Optical Inspection for Module-Level Defects in LCD;IEEE Internet of Things Journal;2022-01-15

2. Automatic defect recognition of TFT array process using gray level co-occurrence matrix;Optik;2014-06

3. Micro- and Nanopatterning Techniques for Organic Electronic and Optoelectronic Systems;Chemical Reviews;2007-04-01

4. Developments in colour display devices;Review of Progress in Coloration and Related Topics;2003-06

5. Electrophotographically printed insulator;Materials Letters;2002-01

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