MOCVD growth of (100)-oriented CeO2 thin films on hydrogen-terminated Si(100) substrates
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference23 articles.
1. A proposal of epitaxial oxide thin film structures for future oxide electronics
2. Review on Future Ferroelectric Nonvolatile Memory: FeRAM
3. Room-Temperature Epitaxial Growth of $\bf CeO_{2}$ Thin Films on Si(111) Substrates for Fabrication of Sharp Oxide/Silicon Interface
4. Growth of (110)‐oriented CeO2layers on (100) silicon substrates
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