Author:
Bocchi C.,Germini F.,Mukhamedzhanov E.Kh.,Nasi L.,Privitera V.,Spinella C.
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference8 articles.
1. Semiconductor Industry Association, International Technology Roadmap for Semiconductors: 1999 edition, International SEMATECH, Austin, TX, 1999.
2. Damage, defects and diffusion from ultra-low energy (0–5 keV) ion implantation of silicon
3. N.E.B. Cowern, E.J.H. Collart, J. Politiek, P.H.L. Bancken, J.G.M. Van Berkum, K. Kyllesbech Larsen, P.A. Stolk, H.G.A. Huizing, P. Pichler, A. Burenkov, D.J. Gravesteijn, Mater. Res. Soc. Symp. Proc., vol. 469, 1997, p. 265.
4. Ion beams in silicon processing and characterization
5. Investigation of lattice distortions in InP crystals implanted with Fe+ions by means of high‐resolution x‐ray diffraction and x‐ray standing‐wave methods
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