A comparative study of conventional magnetron sputter deposited and plasma enhanced magnetron sputter deposited Ti–Si–C–N nanocomposite coatings
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference37 articles.
1. Synthesis and characterization of quaternary Ti–Si–C–N coatings prepared by a hybrid deposition technique
2. Microstructure and mechanical properties of hard Ti–Si–C–N films deposited by dc magnetron sputtering of multicomponent Ti/C/Si target
3. A new class of Ti–Si–C–N coatings obtained by chemical vapor deposition, Part III: 650–800 °C process
4. A new class of Ti–Si–C–N coatings obtained by chemical vapor deposition — part II: low-temperature process
5. Protonic conductivity nanostructured ceramic film with improved resistance to carbon dioxide at elevated temperatures
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