Origin of high temperature oxidation resistance of Ti–Al–Ta–N coatings-Reference-Cited by-同舟云学术

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Origin of high temperature oxidation resistance of Ti–Al–Ta–N coatings

Published:2014-10 Issue: Volume:257 Page:78-86
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Hollerweger R.,Riedl H.,Paulitsch J.,Arndt M.,Rachbauer R.,Polcik P.,Primig S.,Mayrhofer P.H.

Funder

Austrian Federal Ministry of Economy, Family and Youth

National Foundation for Research, Technology and Development

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference60 articles.

1. Thermal oxidation of Ti1 − xAlxN coatings in air

2. Composition dependence of the initial oxidation films studied by XAS and XPS;Esaka,1999

3. High-temperature oxidation of ion-plated TiN and TiAlN films

4. Effects of Aluminum Concentration on the Oxidation Behaviors of Reactively Sputtered TiAlN Films

5. Titanium aluminum nitride films: A new alternative to TiN coatings

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