Boundary-free multi-element barrier films by reactive co-sputtering
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference15 articles.
1. Chemical Properties of Amorphous Metals
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2. Annealing of sputter-deposited nanocrystalline Cr–Ta coatings in a low-oxygen-containing atmosphere;Thin Solid Films;2012-09
3. Effect of nitrogen concentration to the structural, chemical and electrical properties of tantalum zirconium nitride films;Ceramics International;2012-05
4. Effects of the structural layer in MEMS substrates on mechanical and electrical properties of Pb(Zr0.52Ti0.48)O3 films;Ceramics International;2011-09
5. EFFECT OF N CONTENT ON THE THERMAL STABILITY OF Ta–Si–N THIN FILM BARRIER LAYER;International Journal of Modern Physics B;2010-12-10
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