Growth kinetics of W5Si3 layer in WSi2/W system-Reference-Cited by-同舟云学术

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Growth kinetics of W5Si3 layer in WSi2/W system

Published:2004-10 Issue:2-3 Volume:187 Page:146-153
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Lee Kyung-Hwan,Yoon Jin-Kook,Lee Jong-Kwon,Doh Jung-Mann,Hong Kyung-Tae,Yoon Woo-Young

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference18 articles.

1. High Temperature Silicides and Refractory Alloys;Bartha,1993

2. Thermal Oxidation of Tungsten‐Based Sputtered Coatings

3. Kinetics of the Oxidation of Pure Tungsten from 500° to 1300°C

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