Effect of nitrogen flow rate on structure and properties of nanocrystalline TiN thin films produced by unbalanced magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference24 articles.
1. The effect of substrate temperature and biasing on the mechanical properties and structure of sputtered titanium nitride thin films
2. Development of preferred orientation in polycrystalline TiN layers grown by ultrahigh vacuum reactive magnetron sputtering
3. Effect of substrate preparation and deposition conditions on the preferred orientation of TiN coatings deposited by RF reactive sputtering
4. The effect of ion current density on the adhesion and structure of coatings deposited by magnetron sputter ion plating
5. Effect of processing parameters on the microstructure and mechanical properties of TiN film on stainless steel by HCD ion plating
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