Argon-to-hydrogen ratio in plasma jet diamond chemical vapour deposition-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Argon-to-hydrogen ratio in plasma jet diamond chemical vapour deposition

Published:2005-01 Issue:1 Volume:190 Page:48-53
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Huang T.B.,Tang W.Z.,Lu F.X.,Gracio J.,Ali N.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference44 articles.

1. Accurate measurement of fracture toughness of free standing diamond films by three-point bending tests with sharp pre-cracked specimens

2. Economical deposition of a large area of high quality diamond film by a high power DC arc plasma jet operating in a gas recycling mode

3. Large area high quality diamond film deposition by high power DC arc plasma jet operating at gas recycling mode

4. Preparation of diamond wafers by DC arcjet plasma process under a gas recycling mode

5. A new type of DC arc plasma torch for low cost large area diamond deposition

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A Comparative Study on the Wear Mechanisms of Uncoated and TiAlTaN-Coated Tools Used in Machining AMPCO® Alloy;Coatings;2023-12-19

2. The 7-in. freestanding diamond thermal conductive film fabricated by DC arc Plasma Jet CVD with multi-stage magnetic fields;Diamond and Related Materials;2022-02

3. Structural evolution of Ti destroyable interlayer in large-size diamond film deposition by DC arc plasma jet;Applied Surface Science;2016-05

4. Effect of arc characteristics on the properties of large size diamond wafer prepared by DC arc plasma jet CVD;Diamond and Related Materials;2013-10

5. Influence of Ar/C2H2 ratio on the structure of hydrogenated carbon films;Journal of Non-Crystalline Solids;2009-07

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3