Atmospheric pressure MOCVD of TiO2 thin films using various reactive gas mixtures
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference28 articles.
1. Deposition of SiO2 and TiO2 thin films by plasma enhanced chemical vapor deposition for antireflection coating
2. Manufacturing method for transparent electric windows using dye-sensitized TiO2 solar cells
3. TiO2 Coating by Atmospheric Pressure MOCVD in a Conveyor Belt Furnace for Industrial Applications
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