The effect of the substrate position on microwave plasma chemical vapor deposition of diamond films-Reference-Cited by-同舟云学术

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The effect of the substrate position on microwave plasma chemical vapor deposition of diamond films

Published:2006-02 Issue:10 Volume:200 Page:3156-3159
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Lin C.R.,Su C.H.,Hung C.H.,Chang C.Y.,Yan Shi-Hao

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference15 articles.

1. Self-consistent microwave field and plasma discharge simulations for a moderate pressure hydrogen discharge reactor

2. Enhancement of diamond film uniformity in a biased microwave-plasma-enhanced chemical vapor deposition system

3. The preparation of (001) textured diamond films with large areas

4. Low roughness diamond films produced at temperatures less than 600°C

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Preparation Method of CVD Diamond and Novel Ideas for Increasing Growth Rate;Journal of Engineering Studies;2017-12-01

2. Morphology of the Diamond Thin Films Grown by Microwave Plasma Chemical Vapor Deposition with Different Aftertreatments;Advanced Materials Research;2010-10

3. The Formation of Nanocrystalline Diamond Coating on WC Deposited by Microwave Assisted Plasma CVD;AIP Conference Proceedings;2010

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