Modeling of electron temperature and DC bias voltage in an inductively-coupled Cl 2 /Ar plasma using neural network-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Modeling of electron temperature and DC bias voltage in an inductively-coupled Cl 2 /Ar plasma using neural network

Published:2013-09 Issue: Volume:231 Page:546-549
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Kim Moonkeun,Jang Hanbyeol,Lee Yong-Hwa,Kwon Kwang-Ho,Park Kang-Bak

Funder

Industrial Strategic Technology Development Program

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference10 articles.

1. Modeling etch rate and uniformity of oxide via etching in a CHF3/CF4 plasma using neural networks

2. Impact of radio frequency source power-induced ion energy on a refractive index of SiN film deposited by a pulsed-PECVD at room temperature

3. Wavelet Coefficient Trained Neural Network Classifier for Improvement in Qualitative Classification Performance of Oxygen-Plasma Treated Thick Film Tin Oxide Sensor Array Exposed to Different Odors/Gases

4. Etch characteristics of HfO2 films on Si substrates

5. Selective etching of high-k HfO2 films over Si in hydrogen-added fluorocarbon (CF4∕Ar∕H2 and C4F8∕Ar∕H2) plasmas

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP