Development and application of cathodic vacuum arc plasma for nanostructured and nanocomposite film deposition-Reference-Cited by-同舟云学术

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Development and application of cathodic vacuum arc plasma for nanostructured and nanocomposite film deposition

Published:2013-08 Issue: Volume:229 Page:36-41
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Medhisuwakul M.,Pasaja N.,Sansongsiri S.,Kuhakan J.,Intarasiri S.,Yu L.D.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference13 articles.

1. T.A. Edison, Process of Duplicating Phonograms, US Patent 484 582, October 18, 1892.

2. L.P. Sablev et al., US Patents 3,783,231, Jan. 1, 1974; 3,793,179, Feb. 19, 1974.

3. Handbook of Vacuum Arc Science and Technology,1995

4. Review of cathodic arc deposition technology at the start of the new millennium

5. Cathodic Arcs: From Fractal Spots to Energetic Condensation;Anders,2008

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4. Movement of luminous group spots on target and size modification of micro-particles during cathodic vacuum arc deposition;Vacuum;2019-06

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