In-situ monitoring of plasma enhanced nitriding processes using infrared absorption and mass spectroscopy-Reference-Cited by-同舟云学术

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In-situ monitoring of plasma enhanced nitriding processes using infrared absorption and mass spectroscopy

Published:2012-05 Issue:19-20 Volume:206 Page:3955-3960
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Burlacov I.,Börner K.,Spies H.-J.,Biermann H.,Lopatik D.,Zimmermann H.,Röpcke J.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference18 articles.

1. J. Georges, US Patent 5,989,363 (1999).

2. Study on the active screen plasma nitriding and its nitriding mechanism

3. Active screen plasma nitriding – an overview

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