Nanocrystalline thin films synthesized from a Ti2AlN compound target by high power impulse magnetron sputtering technique-Reference-Cited by-同舟云学术

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Nanocrystalline thin films synthesized from a Ti2AlN compound target by high power impulse magnetron sputtering technique

Published:2012-11 Issue: Volume:212 Page:199-206
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Zhang Teng Fei,Wang Qi Min,Lee Junghoon,Ke Peiling,Nowak Roman,Kim Kwang Ho

Funder

NRF

MEST

Guangzhou Scientific and Technological Planning Project

International Cooperation Foundation of Ningbo Government

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference38 articles.

1. The MN+1AXN phases: A new class of solids

2. Epitaxial Ti2AlN(0001) thin film deposition by dual-target reactive magnetron sputtering

3. Single-crystal Ti2AlN thin films

4. The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge

5. Origins of ion energy distribution function (IEDF) in high power impulse magnetron sputtering (HIPIMS) plasma discharge

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