PI3D apparatus and technology at KERI-Reference-Cited by-同舟云学术

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PI3D apparatus and technology at KERI

Published:2007-04 Issue:15 Volume:201 Page:6495-6501
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Rim G.H.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference26 articles.

1. Handbook of Plasma Immersion Ion Implantation and Deposition,2000

2. Proceed. of the 25th Int. Conf. on Plasma Science (ICOPS'98), USA;Cho,1998

3. Proceed. of the Korean IEE (KIEE) 1998 Summer Conf., Korea;Kim,1998

4. Dynamics of high-voltage pulsed cylindrical sheath

5. Proceed. of the 26th Int. Conf. on Plasma Science (ICOPS'99), USA;Kim,1999

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. DLC Coatings by PI3D: Low-Voltage žersus High-Voltage Biasing;Acta Physica Polonica A;2009-06

2. PI3D processing of DLC coatings for different applications;physica status solidi (c);2008-04

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