X-ray diffraction measurement of residual stress and crystal orientation in Au/NiCr/Ta films prepared by plating
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
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1. On the reliability of ZrO2 films for VLSI applications
2. Effect of the critical size of initial voids on stress-induced migration
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5. Stability of silver thin films on various underlying layers at elevated temperatures
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