Effect of post-deposition annealing on ZrW2O8 thin films prepared by radio frequency magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference16 articles.
1. Negative Thermal Expansion from 0.3 to 1050 Kelvin in ZrW 2 O 8
2. Negative Thermal Expansion in ZrW2O8 and HfW2O8
3. Structural investigation of the negative-thermal-expansion material ZrW2O8
4. Synthesis of negative-thermal-expansion ZrW2O8 substrates
5. Preparation of Dense ZrO2/ZrW2O8 Cosintered Ceramics with Controlled Thermal Expansion Coefficients
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1. Preparation and negative thermal expansion properties of Y2W3O12 thin films grown by pulsed laser deposition;Ceramics International;2016-12
2. Preparation and optical, nanomechanical, negative thermal expansion properties of Sc2W3O12 thin film grown by pulsed laser deposition;Ceramics International;2016-05
3. Effects of substrate temperature and oxygen pressure in pulsed laser deposited ZrW1.5Mo0.5O8 thin films;Ceramics International;2015-11
4. Synthesis of negative thermal expansion HfW2O8 thin film using pulsed laser deposition;Ceramics International;2014-11
5. Study of thermal stability and mechanical properties of fcc phase Zr22W19N58 thin films deposited by reactive magnetron sputtering;Surface and Coatings Technology;2014-04
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