Ab initio supported development of Nb- and Ta-alloyed (Ti,Al)N thin films with improved thermal stability-Reference-Cited by-同舟云学术

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Ab initio supported development of Nb- and Ta-alloyed (Ti,Al)N thin films with improved thermal stability

Published:2024-05 Issue: Volume:483 Page:130763
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Hu Chun,Zhang Jie,Liu Hui J.,Du J.W.,Chen Li,Kong Yi,Mayrhofer Paul H.

Funder

National Natural Science Foundation of China

China Scholarship Council

Publisher

Elsevier BV

Reference72 articles.

1. Ion kinetic energy- and ion flux-dependent mechanical properties and thermal stability of (Ti,Al)N thin films;Karimi Aghda;Acta Mater.,2023

2. Thermal stability, mechanical properties, and tribological performance of TiAlXN coatings: understanding the effects of alloying additions;Liew;J. Mater. Res. Technol.,2022

3. Decomposition pathways in age hardening of Ti-Al-N films;Rachbauer;J. Appl. Phys.,2011

4. Hard coatings for cutting applications: physical vs. chemical vapor deposition and future challenges for the coatings community;Schalk;Surf. Coat. Technol.,2022

5. Nanomechanical properties of AlN(103) thin films by nanoindentation;Jian;J. Alloys Compd.,2010

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