Electrodeposition of CoMoP thin film as diffusion barrier layer for ULSI applications-Reference-Cited by-同舟云学术

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Electrodeposition of CoMoP thin film as diffusion barrier layer for ULSI applications

Published:2009-09 Issue:24 Volume:203 Page:3692-3700
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Hamid Z. Abdel,Aal A. Abdel,Shaaban Ali,Hassan H.B.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference46 articles.

1. Fundamentals of Electrochemical Deposition;Paunovic,1998

2. Diffusion barriers in thin films

3. Advanced Inorganic Chemistry;Cotton,1988

4. Proceedings of the International Conference on Solid-State Sensors and Actuators, Transducers '97, Chicago;Taylor,1997

Cited by 22 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Study on hardness and corrosion resistance of Co-Mo-P/ZrO2 composite coating electrodeposited on Q345 steel;International Journal of Electrochemical Science;2024-06

2. Co-deposition of nanocrystalline Co–Mo catalysts with a new fluffy microstructure for hydrogen evolution reaction based on N, N-dimethylformamide and ethylene glycol system;International Journal of Hydrogen Energy;2023-09

3. Study on Electrochemical Behavior and Mechanical Performance of CoWP Alloy Coating Prepared on Q215A Steel by Electrodeposition;International Journal of Electrochemical Science;2022-11

4. Advances on Cr and Ni Electrodeposition for Industrial Applications—A Review;Coatings;2022-10-15

5. Research on Mechanical Property of CoMo and CoMoP Coatings Electrodeposited on Iron Substrate;International Journal of Electrochemical Science;2022-08

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