Metallic sputtering growth of high quality anatase phase TiO2 films by inductively coupled plasma assisted DC reactive magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference42 articles.
1. Titanium dioxide photocatalysis
2. Electronic structure of the indium tin oxide/nanocrystalline anatase (TiO[sub 2])/ruthenium-dye interfaces in dye-sensitized solar cells
3. Quantitative Evaluation of the Photoinduced Hydrophilic Conversion Properties of TiO2 Thin Film Surfaces by the Reciprocal of Contact Angle
4. Electrical and optical properties of TiO2anatase thin films
5. High quality anatase TiO2 film: Field-effect transistor based on anatase TiO2
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1. Reactive pulsed DC magnetron sputtering deposition of vanadium oxide thin films: Role of pulse frequency on the film growth and properties;Applied Surface Science;2021-10
2. Growth orientation-related enhancement of electrical properties in (Na0.85K0.15)0.5Bi0.5TiO3-based composite films;Journal of the European Ceramic Society;2019-02
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