Ti1−xAlxN coatings by Reactive High Power Impulse Magnetron Sputtering: film/substrate interface effect on residual stress and high temperature oxidation-Reference-Cited by-同舟云学术

Ti1−xAlxN coatings by Reactive High Power Impulse Magnetron Sputtering: film/substrate interface effect on residual stress and high temperature oxidation

Published:2018-11 Issue: Volume:354 Page:56-65
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Deambrosis S.M.^ORCID,Montagner F.,Zin V.,Fabrizio M.,Badini C.,Padovano E.,Sebastiani M.,Bemporad E.,Brunelli K.,Miorin E.^ORCID

Funder

The Italian National Research Council

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference53 articles.

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