Plasma nanotexturing of amorphous carbon films by reactive ion etching-Reference-Cited by-同舟云学术

Plasma nanotexturing of amorphous carbon films by reactive ion etching

Published:2018-11 Issue: Volume:354 Page:153-160
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Godoy Armstrong^ORCID,Carlucci Felipe Gondim,Leite Douglas Marcel Gonçalves,Miyakawa Walter,Pereira André Luis Jesus,Massi Marcos^ORCID,da Silva Sobrinho Argemiro Soares

Funder

CAPES

CNPq

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

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