Chromium and titanium film deposition using a hot refractory anode vacuum arc plasma source-Reference-Cited by-同舟云学术

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Chromium and titanium film deposition using a hot refractory anode vacuum arc plasma source

Published:2008-12 Issue:5-7 Volume:203 Page:501-504
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Beilis I.I.,Shnaiderman A.,Boxman R.L.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference10 articles.

1. Handbook of Vacuum Arc Science and Technology,1995

2. Review of the filtered vacuum arc process and materials deposition

3. The anodic vacuum arc. II. Experimental study of arc plasma

4. Interelectrode plasma evolution in a hot refractory anode vacuum arc: Theory and comparison with experiment

5. The hot refractory anode vacuum arc: a new plasma source for metallic film deposition

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