Simulation of molecular dynamics associated with surface roughness on an Al thin film
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference16 articles.
1. Void formation during film growth: A molecular dynamics simulation study
2. Modeling of epitaxial growth
3. A molecular dynamics study of nickel vapor deposition: Temperature, incident angle, and adatom energy effects
4. A study of hillock formation on AlTa alloy films for interconnections of TFT-LCDs
5. Mo-capped Al–Nd alloy for both gate and data bus lines of liquid crystal displays
Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Evolution of the Microstructure, Hybridization, and Internal Stress of Al-Doped Diamond-Like Carbon Coatings: A Molecular Dynamics Simulation;Langmuir;2023-03-06
2. Deposition characteristics of CoCrFeMnNi high-entropy alloys thin film via simulation;Journal of Crystal Growth;2023-02
3. Evolution of surface roughness of a cast Al-Si-Cu piston alloy during thermal exposure;Journal of Central South University;2020-06
4. Molecular dynamics simulation of surface morphology during homoepitaxial growth of Copper;The European Physical Journal Applied Physics;2019-09
5. Investigation of fcc and hcp island nucleated during homoepitaxial growth of copper by molecular dynamics simulation;Superlattices and Microstructures;2019-03
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3