Characterization and optimization of porogen-based PECVD deposited extreme low-k materials as a function of UV-cure time-Reference-Cited by-同舟云学术

Characterization and optimization of porogen-based PECVD deposited extreme low-k materials as a function of UV-cure time

Published:2007-09 Issue:22-23 Volume:201 Page:9264-9268
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Verdonck Patrick,De Roest David,Kaneko Shinya,Caluwaerts Rudy,Tsuji Naoto,Matsushita Kiyohiro,Kemeling Nathan,Travaly Youssef,Sprey Hessel,Schaekers Marc,Beyer Gerald

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference8 articles.

1. Effects of Annealing Condition on Low-k a-SiOC:H Thin Films

2. Short-ranged structural rearrangement and enhancement of mechanical properties of organosilicate glasses induced by ultraviolet radiation

3. Thermomechanical properties of thin organosilicate glass films treated with ultraviolet-assisted cure

4. A theoretical and experimental study of atomic-layer-deposited films onto porous dielectric substrates

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