Enhanced photoelectrochemical performance of atomic layer deposited Hf-doped ZnO
Author:
Funder
UiT The Arctic University of Norway
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference89 articles.
1. Photoelectrochemical cells;Grätzel;Nature,2001
2. A monolithic photovoltaic-photoelectrochemical device for hydrogen production via water splitting;Khaselev;Science,1998
3. Efficient photochemical water splitting by a chemically modified n-TiO2;Khan;Science,2002
4. A review and recent developments in photocatalytic water-splitting using TiO2 for hydrogen production;Ni;Renew. Sust. Energ. Rev.,2007
5. Hydrogen-treated TiO2 nanowire arrays for photoelectrochemical water splitting;Wang;Nano Lett.,2011
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