Effect of carbon content on structure and properties of WCN coatings prepared by RF magnetron sputtering-Reference-Cited by-同舟云学术

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Effect of carbon content on structure and properties of WCN coatings prepared by RF magnetron sputtering

Published:2016-02 Issue: Volume:287 Page:129-137
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Zhao Hongjian,Ni Zenglei,Ye Fuxing

Funder

National Natural Science Foundation of China

Natural Science Foundation of Tianjin

Specialized Research Fund for the Doctoral Program of Higher Education

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference40 articles.

1. Deposition of tungsten nitride thin films by plasma focus device at different axial and angular positions;Hosseinnejad;Appl. Surf. Sci.,2011

2. Microstructural properties of plasma-enhanced chemical vapor deposited WNx films using WF6–H2–N2 precursor system;Kim;Curr. Appl. Phys.,2007

3. Electrical resistivity, structure and composition of dc sputtered WNx films;Boukhris;Thin Solid Films,1997

4. Structure and properties of WC–CrAlN superlattice films by cathodic arc ion plating process;Lee;Thin Solid Films,2002

5. Diffusion barrier properties of tungsten nitride films grown by atomic layer deposition from bis (tert-butylimido) bis (dimethylamido) tungsten and ammonia;Becker;Appl. Phys. Lett.,2003

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