Influence of argon flow rate on TiO2 photocatalyst film deposited by dc reactive magnetron sputtering-Reference-Cited by-同舟云学术

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Influence of argon flow rate on TiO2 photocatalyst film deposited by dc reactive magnetron sputtering

Published:2004-04 Issue:2-3 Volume:182 Page:192-198
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Zhang Wenjie,Li Ying,Zhu Shenglong,Wang Fuhui

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference23 articles.

1. Titanium dioxide photocatalysis

2. Synthesis of anatase TiO2 supported on porous solids by chemical vapor deposition

3. Photocatalytic Activity of TiO2 Films Preserved under Different Conditions: The Gas-Phase Photocatalytic Degradation Reaction of Trichloroethylene

4. Effect of substrates on the photocatalytic activity of nanometer TiO2 thin films

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