Author:
Tkaczyk S.,Carter H.,Flaugher B.,Gonzales B.,Hrycyk M.,Nelson C.,Segler S.,Shaw T.,Turner K.,Wesson T.R.,Barnett B.,Boswell C.,Skarha J.,Snider F.D.,Spies A.,Tseng J.,Barbaro-Galtieri A.,Carithers W.C.,Ely R.,Haber C.,Holland S.,Kleinfelder S.,Produit N.,Schneider O.,Shapiro M.D.,Wester W.,Wong M.,Yao W.,Amidei D.,Derwent P.F.,Dunn A.,Song T.,Vejcik S.,Bacchetta N.,Gold M.,Matthews J.,Bisello D.,Busetto G.,Castro A.,Loreti M.,Pescara L.,Bedeschi F.,Bolognesi V.,Dell'Agnello S.,Galeotti S.,Mariotti M.,Menzione A.,Punzi G.,Raffaelli F.,Ristori L.,Tartarelli F.,Turini N.,Wenzel H.,Zetti F.,Bailey M.W.,Garfinkel A.F.,Shaw N.M.,Hughes R.,Tipton P.,Watts G.
Subject
Instrumentation,Nuclear and High Energy Physics
Reference19 articles.
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4. Manufactured by Micron Semiconductor Ltd., 1 Royal Buildings, Marlborough Road, Churchill Ind. Estate, Lancing, Sussex BN15 8UN, England.
5. Manufactured by Rohm Tech., Inc., 195 Canal Street, Maiden, MA 02148, USA.
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