Fluorine—an enabler in advanced photolithography-Reference-Cited by-同舟云学术

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Fluorine—an enabler in advanced photolithography

Published:2003-07 Issue:1 Volume:122 Page:3-10
ISSN:0022-1139
Container-title:Journal of Fluorine Chemistry
language:en
Short-container-title:Journal of Fluorine Chemistry

Author:

Rothschild M.,Bloomstein T.M.,Fedynyshyn T.H.,Liberman V.,Mowers W.,Sinta R.,Switkes M.,Grenville A.,Orvek K.

Publisher

Elsevier BV

Subject

Inorganic Chemistry,Organic Chemistry,Physical and Theoretical Chemistry,Environmental Chemistry,Biochemistry

Reference21 articles.

1. Lithography with 157 nm lasers

2. Gain measurements at 157 nm in an F2 pulsed discharge molecular laser

3. Long-run-time performance characteristics of a line-selected 2-kHz F 2 laser for optical microlithography

4. Advanced F 2 -lasers for 157-nm lithography

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1. Air shield system to reduce lens contamination in optical lithography based on turbulence simulation;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-12-10

2. Engineering block copolymer materials for patterning ultra-low dimensions;Molecular Systems Design & Engineering;2020

3. On the theoretical foundation for the microcutting of calcium fluoride single crystals at elevated temperatures;Proceedings of the Institution of Mechanical Engineers, Part B: Journal of Engineering Manufacture;2016-08-29

4. Halofluorocarbons, Hydrofluorocarbons, and Related Compounds;Modern Fluoroorganic Chemistry;2013-03-05

5. Sol–Gel Strategy for Self-Induced Fluorination and Dehydration of Silica with Extended Vacuum Ultraviolet Transmittance and Radiation Hardness;Chemistry of Materials;2012-02-06

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