Fluorocarbon dielectrics via hot filament chemical vapor deposition-Reference-Cited by-同舟云学术

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Fluorocarbon dielectrics via hot filament chemical vapor deposition

Published:2003-07 Issue:1 Volume:122 Page:93-96
ISSN:0022-1139
Container-title:Journal of Fluorine Chemistry
language:en
Short-container-title:Journal of Fluorine Chemistry

Author:

Lau Kenneth K.S.,Murthy Shashi K.,Lewis Hilton G.Pryce,Caulfield Jeffrey A.,Gleason Karen K.

Publisher

Elsevier BV

Subject

Inorganic Chemistry,Organic Chemistry,Physical and Theoretical Chemistry,Environmental Chemistry,Biochemistry

Reference17 articles.

1. International Technology Roadmap for Semiconductors 2001 Edition at: http://public.itrs.net/Files/2001ITRS/Home.htm.

2. Fluorocyclopropanes. I. Preparation and nuclear magnetic resonance spectra

3. The reversible difluorocarbene elimination from hexafluoropropylene epoxide

4. The pyrolysis of hexafluoropropylene oxide

5. Growth of fluorocarbon polymer thin films with high CF2 fractions and low dangling bond concentrations by thermal chemical vapor deposition

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