Optical and electrochemical capacitive properties of copper (I) iodide thin film deposited by SILAR method-Reference-Cited by-同舟云学术

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Optical and electrochemical capacitive properties of copper (I) iodide thin film deposited by SILAR method

Published:2019-12 Issue:8 Volume:12 Page:5380-5391
ISSN:1878-5352
Container-title:Arabian Journal of Chemistry
language:en
Short-container-title:Arabian Journal of Chemistry

Author:

Ezealigo Blessing N.,Nwanya Assumpta C.,Simo Aline,Osuji Rose U.,Bucher R.,Maaza Malik,Ezema Fabian I.

Funder

US Army Research Laboratory–Broad Agency Announcement

Publisher

Elsevier BV

Subject

General Chemical Engineering,General Chemistry

Reference68 articles.

1. Refractive index dispersion and optical properties of dye doped polystyrene films;Alwan;Malaysian Polym. J.,2010

2. Structural characterization and electrochemical properties of cerium-vanadium (Ce-V) mixed oxide films synthesized by chemical route;Amaechi;Ceram. Int.,2016

3. Investigation on the I2: CuI thin films and its stability over time;Amalina;Microelectron. Eng.,2013

4. Formation of CuI colloidal particles in aqueous solution;Bokshits;Colloid J.,2003

5. Deposition of copper iodide thin films by chemical bath deposition(CBD) and successive ionic layer adsorption and reaction (SILAR) methods;Bulakhe;Curr. Appl. Phys.,2013

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