The morphology of high-rate physical-vapor-deposited Ti and Co-Reference-Cited by-同舟云学术

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The morphology of high-rate physical-vapor-deposited Ti and Co

Published:1968-08 Issue:4 Volume:15 Page:385-394
ISSN:0022-5088
Container-title:Journal of the Less Common Metals
language:en
Short-container-title:Journal of the Less Common Metals

Author:

Marcus H.L.,Jean D.,Turk C.D.

Publisher

Elsevier BV

Subject

General Engineering

Reference10 articles.

1. Condensation and Evaporation, Nucleation and Growth Kinetics;Hirth,1963

2. Condensation and Evaporation of Solids;Rutner,1964

3. Vapor Deposition;Powell,1966

4. Improved Thermionic Emitter Using Uniaxially Oriented Tungsten

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. High Rate Thick Film Growth;Annual Review of Materials Science;1977-08

2. Influence of condensation temperature on microstructure and tensile properties of titanium sheet produced by high-rate physical vapor deposition process;Metallurgical Transactions;1973-01

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