The oxidation of tantalum-hafnium polycrystals and single crystals in the temperature range 750 °

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The oxidation of tantalum-hafnium polycrystals and single crystals in the temperature range 750 °–1050 °C

Published:1971-10 Issue:2 Volume:25 Page:115-122
ISSN:0022-5088
Container-title:Journal of the Less Common Metals
language:en
Short-container-title:Journal of the Less Common Metals

Author:

Dooley R.B.,Stringer J.

Publisher

Elsevier BV

Subject

General Engineering

Reference7 articles.

1. High temperature oxidation-resistant Hf-Ta alloys;Marnoch,1965

2. The oxidation of ta single crystals andpolycrystals in the temperature range 850°C–1100°C

3. The oxidation of tantalum-niobium single crystals and polycrystals in the temperature range 850 °–1050 °C

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1. Hf-O-Ta Ternary Phase Diagram Evaluation;MSI Eureka;2023-12-04

2. Hf-O-Ta Ternary Phase Diagram Evaluation;MSI Eureka;2018-03-31

3. In situ quantification of electrochemical dissolution of hafnium-tantalum alloys in acidic media;Electrochemistry Communications;2015-10

4. Combinatorial investigation of Hf–Ta thin films and their anodic oxides;Electrochimica Acta;2010-11

5. The Interaction of Stress and Mechanical Property Effects during Oxidation of Tantalum Base Alloys;Journal of The Electrochemical Society;1980-09-01

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