The thermodynamic approach to boron chemical vapour deposition based on a computer minimization of the total gibbs free energy-Reference-Cited by-同舟云学术

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The thermodynamic approach to boron chemical vapour deposition based on a computer minimization of the total gibbs free energy

Published:1979-09 Issue:1 Volume:67 Page:85-100
ISSN:0022-5088
Container-title:Journal of the Less Common Metals
language:en
Short-container-title:Journal of the Less Common Metals

Author:

Naslain R,Thebault J,Hagenmuller P,Bernard C

Publisher

Elsevier BV

Subject

General Engineering

Reference14 articles.

1. Preparative Methods in Solid State Chemistry;Naslain,1972

2. Proc. 2nd Int. Conf. Chem. Vapour Deposition;Carlton,1970

3. Proc. 4th Int. Conf. Chem. Vapor Deposition;Walsh,1973

4. High Temperature Chemistry of Inorganic and Ceramic Materials;Thebault,1977

5. Proc. 6th Int. Conf. Chem. Vapor Deposition;Thebault,1977

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