Fine-grain tungsten by chemical vapor deposition-Reference-Cited by-同舟云学术

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Fine-grain tungsten by chemical vapor deposition

Published:1969-07 Issue:3 Volume:18 Page:229-243
ISSN:0022-5088
Container-title:Journal of the Less Common Metals
language:en
Short-container-title:Journal of the Less Common Metals

Author:

Landingham R.L.,Austin J.H.

Publisher

Elsevier BV

Subject

General Engineering

Reference11 articles.

1. Condensation and Evaporation-Nucleation and Growth Kinetics;Hirth,1963

2. Improved Thermionic Emitter Using Uniaxially Oriented Tungsten

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Tungsten Compounds;Kirk-Othmer Encyclopedia of Chemical Technology;2010-04-16

2. Tungsten Compounds;Kirk-Othmer Encyclopedia of Chemical Technology;2001-04-16

3. Tungsten nitride thin films prepared by MOCVD;Journal of Materials Research;1993-06

4. Chemical vapor deposition of fine-grained equiaxed tungsten films;Surface and Coatings Technology;1991-12

5. Chemical vapor deposition of fine-grained equiaxed tungsten films;Metallurgical Coatings and Thin Films 1991;1991

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