Electron beam lithography and reactive ion etching of nanometer size features in niobium films-Reference-Cited by-同舟云学术

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Electron beam lithography and reactive ion etching of nanometer size features in niobium films

Published:2001-08 Issue:1-2 Volume:15 Page:171-173
ISSN:0928-4931
Container-title:Materials Science and Engineering: C
language:en
Short-container-title:Materials Science and Engineering: C

Author:

Piotrowski T.T.,Piotrowska A.,Kamińska E.,Szopniewski Z.,Koleśnik S.,Wróbel J.,Gierłowski P.,Lewandowski S.

Publisher

Elsevier BV

Subject

Biomaterials,Bioengineering,Mechanics of Materials

Reference9 articles.

1. A tapped-delay-line superconductive chirp filter in shielded microstrip

2. A generalized equivalent circuit applied to a tunable sapphire-loaded superconducting cavity

3. Nanobridges of optimized YBa2Cu3O7thin films for superconducting flux‐flow type devices

4. Fabrication of ultrasmall Nb‐AlOx‐Nb Josephson tunnel junctions

5. Reactive ion etching of niobium in SF6/O2 to produce sloped sidewall profiles

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Top‐Down Fabrication of Ordered Nanophotonic Structures for Biomedical Applications;Advanced Materials Interfaces;2023-12-09

2. High etching rates of bulk Nb in Ar/Cl2 microwave discharge;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2009-03

3. Plasma treatment of bulk niobium surface for SRF cavities;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;2006-12

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