Formation of a-C thin films by plasma-based ion implantation-Reference-Cited by-同舟云学术

Formation of a-C thin films by plasma-based ion implantation

Published:2001-01 Issue:3-4 Volume:2 Page:539-545
ISSN:1468-6996
Container-title:Science and Technology of Advanced Materials
language:en
Short-container-title:Science and Technology of Advanced Materials

Author:

Watanabe Toshiya¹,Yamamoto Kazuhiro²,Koga Yoshinori²,Tanaka Akihiro²

Affiliation:

1. Japan Fine Ceramics Center, Joint Research Consortium of Frontier Carbon Technology, c/o Research Center for Advanced Carbon Materials, AIST Tsukuba Central 5, 1-1-1 Higashi, Tsukuba, 305-8565, Japan

2. Research Center for Advanced Carbon Materials, AIST Tsukuba Central 5, 1-1-1 Higashi, Tsukuba, 305-8565, Japan

Publisher

Informa UK Limited

Subject

General Materials Science

Link

https://www.tandfonline.com/doi/pdf/10.1016/S1468-6996%2801%2900135-8

Reference19 articles.

1. Phase control of cubic boron nitride thin films

2. Cross-sectional transmission electron microscopy observations of c-BN films deposited on Si by ion-beam-assisted deposition

3. Properties of diamond-like carbon

4. Plasma source ion‐implantation technique for surface modification of materials

5. Effects of bonding structure on the properties of plasma immersion ion processed diamondlike carbon films

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