Use of Si KLL Auger shifts and the Auger parameter in XPS to distinguish Ti silicides from a Ti/Si mixture in thin films-Reference-Cited by-同舟云学术

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Use of Si KLL Auger shifts and the Auger parameter in XPS to distinguish Ti silicides from a Ti/Si mixture in thin films

Published:2019-07 Issue: Volume:234 Page:57-63
ISSN:0368-2048
Container-title:Journal of Electron Spectroscopy and Related Phenomena
language:en
Short-container-title:Journal of Electron Spectroscopy and Related Phenomena

Author:

Saheli Ghazal,Kuratomi Takashi,Chen I-cheng,Mack Paul,LaziK Christopher,Anthis Jeffrey,Thompson David M.,Brundle Christopher R.

Funder

Dr. James Castle

Dr. Yuri Uritsky

Publisher

Elsevier BV

Subject

Physical and Theoretical Chemistry,Spectroscopy,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Radiation,Electronic, Optical and Magnetic Materials

Reference7 articles.

1. Bremsstrahlung-induced Auger peaks

2. A study of Si compounds by Zr Lα photoelectron spectroscopy

3. X-ray photoelectron spectroscopy characterization of semiconductor thin films using simultaneous Mg/Zr excitation

4. https://www.thermofisher.com/order/catalog/product/IQLAADGAAFFAFLMAMC.

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