Instrument-related geometrical factors affecting the intensity in XPS and ARXPS experiments

Author:

Herrera-Gomez A.,Aguirre-Tostado F.S.,Mani-Gonzalez P.G.,Vazquez-Lepe M.,Sanchez-Martinez A.,Ceballos-Sanchez O.,Wallace R.M.,Conti G.,Uritsky Y.

Publisher

Elsevier BV

Subject

Physical and Theoretical Chemistry,Spectroscopy,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Radiation,Electronic, Optical and Magnetic Materials

Reference26 articles.

1. Angle-resolved x-ray photoelectron spectroscopy

2. Report on the 47th IUVSTA Workshop ‘Angle-Resolved XPS: the current status and future prospects for angle-resolved XPS of nano and subnano films’

3. ISO/CD 18115: 2007, Surface chemical analysis - Vocabulary. Part 1. General terms and terms for the spectroscopies.

4. Angle-resolved XPS and AES: Depth-resolution limits and a general comparison of properties of depth-profile reconstruction methods

5. A. Herrera-Gomez. Self consistent ARXPS analysis for multilayer conformal films with abrupt interfaces. Internal Report. CINVESTAV-Unidad Queretaro. http://www.qro.cinvestav.mx/∼aanalyzer/arxpsAnalysisSharpIntefaces.pdf.

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