Dispersion forces and Hamaker constants for intergranular films in silicon nitride from spatially resolved-valence electron energy loss spectrum imaging-Reference-Cited by-同舟云学术

Dispersion forces and Hamaker constants for intergranular films in silicon nitride from spatially resolved-valence electron energy loss spectrum imaging

Published:1998-04 Issue:7 Volume:46 Page:2271-2287
ISSN:1359-6454
Container-title:Acta Materialia
language:en
Short-container-title:Acta Materialia

Author:

French R.H.,Müllejans H.,Jones D.J.,Duscher G.,Cannon R.M.,Rühle M.

Publisher

Elsevier BV

Subject

Metals and Alloys,Polymers and Plastics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference68 articles.

1. Grain Boundary Phases in a Hot-Pressed MgO Fluxed Silicon Nitride

2. Impurity Phases in Hot-Pressed Si3N4

3. The identification of thin amorphous films at grain-boundaries in Al2O3

4. Penetration of Polycrystalline Alumina by Glass at High Temperatures

5. Forces between Aluminum Oxide Grains in a Silicate Melt and Their Effect on Grain Boundary Wetting

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