Author:
Edgar Thomas F.,Butler Stephanie W.,Campbell W.Jarrett,Pfeiffer Carlos,Bode Christopher,Hwang Sung Bo,Balakrishnan K.S.,Hahn J.
Subject
Electrical and Electronic Engineering,Control and Systems Engineering
Reference122 articles.
1. Application of neural networks to plasma etch end point detection;Allen;Journal of Vacuum Science and Technology (B),1996
2. Rapid thermal processing uniformity using multivariable control of a circularly symmetric three zone lamp;Apte;IEEE Transactions on Semiconductor Manufacturing,1992
3. Aral, G., Merchant, T., Cole, J. V., Knutson, K., & Jensen, K. (1994). Concurrent engineering of an RTP reactor: Design for control. Proceedings of RTP conference (pp. 288–295).
4. Modeling and control of microelectronics materials processing;Badgwell;Computers and Chemical Engineering,1995
5. Modeling the wafer temperature profile in a multiwafer LPCVD furnace;Badgwell;Journal of the Electrochemical Society,1994
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