Author:
Brazzelli D,Ghidini G,Crivelli B,Zonca R,Bersani M
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference18 articles.
1. The Dielectric Reliability of Very Thin SiO2Films Grown by Rapid Thermal Processing
2. Time-dependent dielectric breakbown evaluation for rapid-thermally grown SiO2 films formed on submicron-grooved Si surfaces
3. Fukuda H, Endoh T, Nomura S. Proceedings of the Third International Symposium on Physics and Chemistry of SiO2 and SiO2–Si Interface, 1996. p. 15
4. Nagamine M, Itoh H, Satake H, Toriumi A. IEDM Tech Dig 1998;n.21-3
5. Shih HH, Yang GS, Liu GJ, Yew TR, Wu JY, Lur W, Shih J, Li F, Shih R, Lu J. Proceedings of the International Conference on Advanced Thermal Processes of Semiconductors, 1999. p. 72
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