Evaluation of rapid thermal processing systems for use in CMOS fabrication-Reference-Cited by-同舟云学术

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Evaluation of rapid thermal processing systems for use in CMOS fabrication

Published:2002-06 Issue:6 Volume:46 Page:777-783
ISSN:0038-1101
Container-title:Solid-State Electronics
language:en
Short-container-title:Solid-State Electronics

Author:

Trivedi V,Pearton S.J

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference8 articles.

1. International Sematech: Annual Report 2000––Realize the Roadmap, 2001

2. Fundamentals of modern VLSI devices;Taur,1998

3. Rapid thermal annealing––theory and practice;Hill,1988

4. Semiconductor physical electronics;Li,1993

5. Ripple pyrometry for rapid thermal annealing;Fiory;Mater Res Soc Symp Proc,1997

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