Reactive deposition of cobalt using bis(2,2,6,6-tetramethyl-3,5-heptanedionato) cobalt(II) from supercritical carbon dioxide-Reference-Cited by-同舟云学术

Reactive deposition of cobalt using bis(2,2,6,6-tetramethyl-3,5-heptanedionato) cobalt(II) from supercritical carbon dioxide

Published:2016-01 Issue: Volume:107 Page:189-195
ISSN:0896-8446
Container-title:The Journal of Supercritical Fluids
language:en
Short-container-title:The Journal of Supercritical Fluids

Author:

Haruki Masashi,Li Shengkai,Qian Gang,Watkins James J.

Funder

National Science Foundation

Publisher

Elsevier BV

Subject

Physical and Theoretical Chemistry,Condensed Matter Physics,General Chemical Engineering

Reference44 articles.

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4. Atomic interdiffusion and diffusive stabilization of cobalt by copper during atomic layer deposition from bis(N-tert-butyl-N′-ethylpropionamidinato) cobalt(II);Elko-Hansen;J. Phys. Chem. Lett.,2014

5. Chemical vapor deposition of copper–cobalt binary films;Gu;Thin Solid Films,1999

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