High-precision mechanical polishing method for diamond substrate using micron-sized diamond abrasive grains

Author:

Kubota Akihisa,Nagae Shin,Motoyama Shuya

Funder

Mazak Foundation

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference29 articles.

1. A review of techniques for polishing and planarizing chemically vapor-deposited (CVD) diamond films and substrates;Malshe;Diam. Relat. Mater.,1999

2. Research on the Abrading, Grinding, or polishing of Diamond;Tolkowsky,1920

3. The abrasion of diamond;Seal;Proc. Roy. Soc. A,1958

4. The polishing of diamond;Grillo;J. Phys. D. Appl. Phys.,1997

5. Diamond polishing;Hird;Proc. R. Soc. Lond. A,2004

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