Effect of continuous in situ cathode polishing on plasma yield and energy in filtered pulsed arc discharge system-Reference-Cited by-同舟云学术

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Effect of continuous in situ cathode polishing on plasma yield and energy in filtered pulsed arc discharge system

Published:2006-10 Issue:10 Volume:15 Page:1677-1681
ISSN:0925-9635
Container-title:Diamond and Related Materials
language:en
Short-container-title:Diamond and Related Materials

Author:

Alakoski Esa,Tiainen Veli-Matti,Kiuru Mirjami

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference22 articles.

1. Reduction of wear in total hip replacement prostheses by amorphous diamond coatings

2. High adhesion of diamond-like films achieved by the pulsed arc-discharge method

3. Energies of carbon plasma beams in the deposition of diamond-like coatings with the pulsed-arc-discharge method

4. An opto-electronic method for measurement of plasma beams generated by the pulsed arc-discharge method

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Vacuum Arc Discharges with Carbon Cathodes;Tetrahedrally Bonded Amorphous Carbon Films I;2018

2. In situ surface oxide reduction with pulsed arc discharge for maximum adhesion of diamond-like carbon coatings;Diamond and Related Materials;2008-12

3. Adhesion of staphylococcal and Caco‐2 cells on diamond‐like carbon polymer hybrid coating;Journal of Biomedical Materials Research Part A;2008-09-01

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