Effect of sputtering target power density on topography and residual stress during growth of nanocomposite nc-TiN/a-SiNx thin films-Reference-Cited by-同舟云学术

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Effect of sputtering target power density on topography and residual stress during growth of nanocomposite nc-TiN/a-SiNx thin films

Published:2004-10 Issue:10 Volume:13 Page:1777-1784
ISSN:0925-9635
Container-title:Diamond and Related Materials
language:en
Short-container-title:Diamond and Related Materials

Author:

Zhang Sam,Sun Deen,Fu Yongqing,Du Hejun,Zhang Qing

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference41 articles.

1. Today's applications and future developments of coatings for drills and rotating cutting tools

2. The search for novel, superhard materials

3. A concept for the design of novel superhard coatings

4. Recent advances of superhard nanocomposite coatings: a review

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